[Ebook.73jr] Delta-doping of Semiconductors
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Book Details :
Published on: 2005-08-22
Released on:
Original language: English
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Doping profiles are a key element in the development of modern semiconductor technology. This book is the first to give a comprehensive review of the theory, fabrication, characterization, and device applications of abrupt, shallow, and narrow doping profiles in semiconductors. After an introductory chapter sets out the basic theoretical and experimental concepts involved, the authors discuss the fabrication of abrupt and narrow doping profiles by several different techniques, including epitaxial growth. They then present the techniques for characterizing doping distributions, followed by several chapters on the inherent physical properties of narrow doping profiles. The latter part of the book deals with specific devices. The book will be of great interest to graduate students, researchers, and engineers in the fields of semiconductor physics and microelectronic engineering. Materials Technology - Australian National University Dr Hoe Tan prepares a wafer ready for insertion into the MOCVD reactor. Materials technology at ANU. CSEM home. last modified November 2002 Chemical Engineering at the University of Florida Publications "Quasi-two-dimensional b-gallium oxide solar-blind photodetectors with ultrahigh responsivity S. Y. Oh J. H. Kim F. Ren S. J. Peartonc and J. Kim ... Semiconductor OneSource: Semiconductor Glossary With over 2000 terms defined and explained Semiconductor Glossary is the most complete reference in the field of semiconductors on the market today.
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